We are a team of surface physicists with expertise in hexagonal boron nitride (h-BN) research, which began at the University of Zürich, Switzerland in 1997. With years of experience, we have successfully fabricated high-quality, single-crystalline h-BN materials with atomic precision on wafer scales up to 4 inches using chemical vapor deposition (CVD) methods.
Our laboratory at the Physik-Institut is equipped with a homemade 4-inch wafer ultra-high vacuum CVD system, alongside advanced growth monitoring and characterization capabilities.
With our expertise and cutting-edge technology, we are committed to providing a reliable source of high-quality h-BN at wafer scale that can unlock the full potential of 2D electronic devices. At SwissBN, we strive to drive innovation in the field of 2D materials and revolutionize the industry with our groundbreaking research and development efforts.