#1 Single-orientation, single-layer hexagonal boron nitride (h-BN) on metal surfaces, up to 4 inch wafer scale
#2 Transferred single-orientation, single-layer h-BN 10×10 mm2 on arbitrary substrates
#3 Direct growth of boron nitride on arbitrary substrates, 2 mm < diameter < 100 mm
#4 Doser for liquids, powders or small solids for ultra-high vacuum handling with low-temperature control (-10°C < T < 80°C)
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